Magnetrons, reactive gases and sputtering

描述

This handbook covers the fundamental aspects of reactive magnetron sputter deposition. This so-called physical vapor deposition technique is used to grow compound thin films. The books starts with an explanation of the four title words. Using a simple model several aspects of the deposition technique are introduced. In the following chapters the book introduces a more complete mode to address some specific features of reactive sputter deposition. Finally, some important points related to thin film growth are introduced and illustrated.